Illamasqua Skin Base Foundation - 01 Versus Haus Labs By Lady Gaga Triclone Skin Tech Medium Coverage Foundation with Fermented Arnica - 340 Medium Cool
Updated on December 10, 2024
Overview
What they are
These products are both vegan and cruelty-free foundations. They have a total of 0 ingredients in common
Cool Features
They both contain hyaluronic acid and Vitamin E
Suited For
They're both likely to be good for anti aging, dry skin, brightening skin, sensitive skin, scar healing and dark spots
Free From
They both do not contain any common allergens
What's Inside
They both contain fragrances, oils and silicones
We independently verify ingredients, and our claims are backed by peer-reviewed research. Spot a product that needs an update? Let us know.
Ingredient Info
Illamasqua Skin Base Foundation 32 ingredients
Haus Labs By Lady Gaga Triclone Skin Tech Medium Coverage Foundation with Fermented Arnica 47 ingredients
What's inside (and what isn't)
What's inside (and what isn't)
At a glance
Click on any of the items below to learn more
Illamasqua Skin Base Foundation 32 ingredients
Haus Labs By Lady Gaga Triclone Skin Tech Medium Coverage Foundation with Fermented Arnica 47 ingredients
Key Ingredients
Benefits
Concerns
Key Ingredients
Benefits
Concerns
Ingredients Side-by-side
Water
Skin ConditioningCyclopentasiloxane
Emollient
Butylene Glycol
Humectant
Glycerin
Humectant
Hydrogenated Polyisobutene
EmollientPEG-10 Dimethicone
Skin Conditioning
Talc
Abrasive
Paraffinum Liquidum
Emollient
Phenyl Trimethicone
Skin Conditioning
Silica
Abrasive
Mica
Cosmetic Colorant
Disteardimonium Hectorite
StabilisingCetyl PEG/PPG-10/1 Dimethicone
Emulsifying
Polymethyl Methacrylate
Dimethicone
Emollient
Phenoxyethanol
Preservative
Isostearic Acid
Cleansing
PEG/PPG-18/18 Dimethicone
Emulsifying
Methylparaben
Preservative
Aluminum Hydroxide
EmollientDimethicone Crosspolymer
Emulsion StabilisingNiacinamide
Smoothing
Hydrogen Dimethicone
Sodium Ascorbyl Phosphate
Antioxidant
Tocopheryl Acetate
Antioxidant
Sodium Hyaluronate
Humectant
Parfum
Masking
Iron Oxides
CI 77491
Cosmetic ColorantCI 77492
Cosmetic ColorantCI 77499
Cosmetic ColorantCI 77891
Cosmetic ColorantWater, Cyclopentasiloxane, Butylene Glycol, Glycerin, Hydrogenated Polyisobutene, PEG-10 Dimethicone, Talc, Paraffinum Liquidum, Phenyl Trimethicone, Silica, Mica, Disteardimonium Hectorite, Cetyl PEG/PPG-10/1 Dimethicone, Polymethyl Methacrylate, Dimethicone, Phenoxyethanol, Isostearic Acid, PEG/PPG-18/18 Dimethicone, Methylparaben, Aluminum Hydroxide, Dimethicone Crosspolymer, Niacinamide, Hydrogen Dimethicone, Sodium Ascorbyl Phosphate, Tocopheryl Acetate, Sodium Hyaluronate, Parfum, Iron Oxides, CI 77491, CI 77492, CI 77499, CI 77891
Water
Skin ConditioningDiphenylsiloxy Phenyl Trimethicone
Skin Conditioning
Phenyl Trimethicone
Skin Conditioning
Caprylyl Methicone
Skin Conditioning
Trimethylsiloxysilicate
Emollient
Propylene Glycol Dibenzoate
Skin ConditioningIsododecane
EmollientGlycerin
Humectant
Butylene Glycol
Humectant
Methyl Trimethicone
Skin Conditioning
Lauryl Polyglyceryl-3 Polydimethylsiloxyethyl Dimethicone
Skin Conditioning
C13-15 Alkane
SolventPolyglyceryl-3 Polydimethylsiloxyethyl Dimethicone
Skin Conditioning
Alcohol Denat.
Antimicrobial
Acrylates/Polytrimethylsiloxymethacrylate Copolymer
Skin ConditioningPolymethylsilsesquioxane
Sorbitan Sesquioleate
Emulsifying
Disteardimonium Hectorite
Stabilising1,2-Hexanediol
Skin Conditioning
Palmitoyl Tetrapeptide-10
Skin Conditioning
Arnica Montana Flower Extract
Masking
Hydrolyzed Hyaluronic Acid
Humectant
Squalane
Emollient
Pseudozyma Epicola/Camellia Sinensis Seed Oil Ferment Extract Filtrate
Humectant
Prunus Armeniaca Kernel Oil
Masking
Solanum Lycopersicum Fruit Extract
Antioxidant
Dunaliella Salina Extract
Skin ConditioningHedychium Coronarium Root Extract
MaskingTocopherol
Antioxidant
Althaea Rosea Flower Extract
Skin ConditioningTaraxacum Officinale Extract
Skin ConditioningPerilla Ocymoides Leaf Extract
TonicPanax Notoginseng Extract
Skin ConditioningGlycyrrhiza Glabra Root Extract
Bleaching
Chamomilla Recutita Extract
Skin Conditioning
Centella Asiatica Extract
Cleansing
Pseudozyma Epicola/Sunflower Seed Oil Ferment Extract Filtrate
Emulsion Stabilising
Caprylyl Glycol
EmollientEthylhexylglycerin
Skin ConditioningMagnesium Sulfate
Polypropylsilsesquioxane
Acrylates/Dimethicone Copolymer
Skin ConditioningTriethoxycaprylylsilane
Dimethicone/Vinyl Dimethicone Crosspolymer
Skin ConditioningAluminum Hydroxide
EmollientCI 77891
Cosmetic ColorantCI 77491
Cosmetic ColorantWater, Diphenylsiloxy Phenyl Trimethicone, Phenyl Trimethicone, Caprylyl Methicone, Trimethylsiloxysilicate, Propylene Glycol Dibenzoate, Isododecane, Glycerin, Butylene Glycol, Methyl Trimethicone, Lauryl Polyglyceryl-3 Polydimethylsiloxyethyl Dimethicone, C13-15 Alkane, Polyglyceryl-3 Polydimethylsiloxyethyl Dimethicone, Alcohol Denat., Acrylates/Polytrimethylsiloxymethacrylate Copolymer, Polymethylsilsesquioxane, Sorbitan Sesquioleate, Disteardimonium Hectorite, 1,2-Hexanediol, Palmitoyl Tetrapeptide-10, Arnica Montana Flower Extract, Hydrolyzed Hyaluronic Acid, Squalane, Pseudozyma Epicola/Camellia Sinensis Seed Oil Ferment Extract Filtrate, Prunus Armeniaca Kernel Oil, Solanum Lycopersicum Fruit Extract, Dunaliella Salina Extract, Hedychium Coronarium Root Extract, Tocopherol, Althaea Rosea Flower Extract, Taraxacum Officinale Extract, Perilla Ocymoides Leaf Extract, Panax Notoginseng Extract, Glycyrrhiza Glabra Root Extract, Chamomilla Recutita Extract, Centella Asiatica Extract, Pseudozyma Epicola/Sunflower Seed Oil Ferment Extract Filtrate, Caprylyl Glycol, Ethylhexylglycerin, Magnesium Sulfate, Polypropylsilsesquioxane, Acrylates/Dimethicone Copolymer, Triethoxycaprylylsilane, Dimethicone/Vinyl Dimethicone Crosspolymer, Aluminum Hydroxide, CI 77891, CI 77491
Ingredient Ratings
Here's what our community thinks of the ingredients in these products.
When to use
Illamasqua Skin Base Foundation 32 ingredients
Haus Labs By Lady Gaga Triclone Skin Tech Medium Coverage Foundation with Fermented Arnica 47 ingredients
Reviews
Here's what our community thinks
